Albrecht Ehrmann: search on Z-Library

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1

Makes FLASH the difference between the intervention group and the treatment-as-usual group in an evaluation study of a structured education and treatment programme for flash glucose monitoring devices in people with diabetes on intensive insulin therapy: study protocol for a randomised controlled trial

Schipfer, Melanie, Albrecht, Carmen, Ehrmann, Dominic, Haak, Thomas, Kulzer, Bernd, Hermanns, Norbert

Journal:

Year:

2018

Language:

english

File:

PDF, 655 KB

english, 2018

2

Comparison of the efficacy of an education program for people with diabetes and insulin pump treatment (INPUT) in a randomized controlled trial setting and the effectiveness in a routine care setting: Results of a comparative effectiveness study

Bergis, Dominik, Ehrmann, Dominic, Albrecht, Carmen, Haak, Thomas, Kulzer, Bernhard, Hermanns, Norbert

Journal:

Patient Education and Counseling

Year:

2019

Language:

english

File:

PDF, 431 KB

english, 2019

3

Ion projection lithography: status of tool and mask developments

Rainer Kaesmaier, Albrecht Ehrmann, Hans Löschner

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 1.14 MB

english, 2001

4

[IEEE 2008 58th Electronic Components and Technology Conference (ECTC 2008) - Lake Buena Vista, FL, USA (2008.05.27-2008.05.30)] 2008 58th Electronic Components and Technology Conference - High aspect ratio TSV copper filling with different seed layers

Wolf, M. Jurgen, Dretschkow, Thomas, Wunderle, Bernhard, Jurgensen, Nils, Engelmann, Gunter, Ehrmann, Oswin, Uhlig, Albrecht, Michel, Bernd, Reichl, Herbert

Year:

2008

Language:

english

File:

PDF, 3.44 MB

english, 2008

5

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Stencil mask technology for ion beam lithography

Ehrmann, Albrecht, Huber, Sabine, Kaesmaier, Rainer, Oelmann, Andreas B., Struck, Thomas, Springer, Reinhard, Butschke, Joerg, Letzkus, Florian, Kragler, Karl, Loeschner, Hans, Rangelow, Ivo W., Greno

Year:

1998

Language:

english

File:

PDF, 2.53 MB

english, 1998

6

Influence of Silicon on Insulator Wafer Stress Properties on Placement Accuracy of Stencil Masks

Kamm, Frank-Michael, Ehrmann, Albrecht, Schäfer, Herbert, Pamler, Werner, Käsmaier, Rainer, Butschke, Jörg, Springer, Reinhard, Haugeneder, Ernst, Löschner, Hans

Journal:

Japanese Journal of Applied Physics

Year:

2002

Language:

english

File:

PDF, 111 KB

english, 2002

7

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Stencil mask key parameter measurement and control

Ehrmann, Albrecht, Elsner, Annika, Liebe, Roman, Struck, Thomas, Butschke, Joerg, Letzkus, Florian, Irmscher, Mathias, Springer, Reinhard, Haugeneder, Ernst, Loeschner, Hans, Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 3.29 MB

english, 2000

8

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Measures to achieve 20nm IPL stencil mask distortion

Haugeneder, Ernst, Chalupka, A., Lammer, T, Loeschner, Hans, Kamm, Frank-Michael, Struck, Thomas, Ehrmann, Albrecht, Kaesmaier, Rainer, Wolter, Andreas, Butschke, Joerg, Irmscher, Mathias, Letzkus, Fl

Year:

2002

Language:

english

File:

PDF, 977 KB

english, 2002

9

SPIE Proceedings [SPIE 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 15 November 1999)] 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Ion projection lithography: progress in mask and tool technology

Ehrmann, Albrecht, Kaesmaier, Rainer, Struck, Thomas, Behringer, Uwe F. W.

Year:

2000

Language:

english

File:

PDF, 3.21 MB

english, 2000

10

SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Progress in placement control for ion beam stencil mask technology

Kamm, Frank-Michael, Ehrmann, Albrecht, Struck, Thomas, Kragler, Karl, Butschke, Joerg, Letzkus, Florian, Springer, Reinhard, Haugeneder, Ernst, Degen, Artur, Voigt, Jens, Kratzenberg, Martin, Rangelo

Year:

2001

Language:

english

File:

PDF, 324 KB

english, 2001

11

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - CD measurements of IPL stencil masks with optical microscopes

Bentfeldt, Arne, Ehrmann, Albrecht, Schaetz, Thomas, Struck, Thomas, Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 1.15 MB

english, 1999

12

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Placement measurement and FE modeling results for distortion control of stencil masks

Ehrmann, Albrecht, Struck, Thomas, Kaesmaier, Rainer, Haugeneder, Ernst, Loeschner, Hans, Butschke, Joerg, Letzkus, Florian, Irmscher, Mathias, Springer, Reinhard, Engelstad, Roxann L., Abboud, Frank

Year:

1999

Language:

english

File:

PDF, 787 KB

english, 1999

13

SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Defect inspection of IPL stencil masks with a KLA 351 tool

Ehrmann, Albrecht, Elsner, Annika, Redemann, Rene, Behringer, Uwe F. W.

Year:

2001

Language:

english

File:

PDF, 661 KB

english, 2001

14

SPIE Proceedings [SPIE 19th European Conference on Mask Technology for Integrated Circuits and Microcomponts - Sonthofen, Germany (Monday 13 January 2003)] 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Mask CD characterization with EUV reflectometry at the electron storage ring BESSY II

Ehrmann, Albrecht, Rau, Jenspeter, Wolter, Andreas, Kamm, Frank-Michael, Mathuni, Josef, Scholze, Frank, Tummler, Johannes, Ulm, Gerhard, Behringer, Uwe F. W.

Year:

2003

Language:

english

File:

PDF, 293 KB

english, 2003

15

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop

Kaesmaier, Rainer, Loeschner, Hans, de Jager, Patrick W., Ehrmann, Albrecht, Hirscher, Stefan, Kragler, Karl, Springer, Reinhard, Stengl, Gerhard, Wolter, Andreas, Behringer, Uwe F. W.

Year:

2002

Language:

english

File:

PDF, 1.65 MB

english, 2002

16

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Loeschner, Hans, Stengl, Gerhard, Buschbeck, Herbert, Chalupka, A., Lammer, Gertraud, Platzgummer, Elmar, Vonach, Herbert, de Jager, Patrick W., Kaesmaier, Rainer, Ehrmann, Albrecht, Hirscher, Stefan,

Year:

2002

Language:

english

File:

PDF, 1.60 MB

english, 2002

17

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - EUV mask development: material and process

Rau, Jenspeter, Wendt, Hermann, Mathuni, Josef, Stepper, Christoph, Ehrmann, Albrecht, Kamm, Frank-Michael, Behringer, Uwe F. W.

Year:

2002

Language:

english

File:

PDF, 308 KB

english, 2002

18

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Progress in placement control for ion beam stencil mask technology

Kamm, Frank-Michael, Ehrmann, Albrecht, Struck, Thomas, Kragler, Karl, Butschke, Joerg, Letzkus, Florian, Springer, Reinhard, Haugeneder, Ernst, Dobisz, Elizabeth A.

Year:

2001

Language:

english

File:

PDF, 393 KB

english, 2001

19

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Ion projection lithography: new insights and results of this NGL technology

Struck, Thomas, Ehrmann, Albrecht, Kaesmaier, Rainer, Loeschner, Hans, Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 784 KB

english, 2001

20

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - Ion projection lithography for IC manufacturing

Ehrmann, Albrecht, Kaesmaier, Rainer, Loeschner, Hans, Behringer, Uwe F. W.

Year:

1999

Language:

english

File:

PDF, 1.22 MB

english, 1999

21

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Stress engineering of SOI silicon stencil masks by boron doping concentration

Degen, Artur, Voigt, Jens, Kratzenberg, Martin, Shi, Feng, Butschke, Joerg, Loeschner, Hans, Kaesmaier, Rainer, Ehrmann, Albrecht, Rangelow, Ivo W., Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 1.12 MB

english, 2000

22

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - PN and SOI wafer flow process for stencil mask fabrication

Butschke, Joerg, Ehrmann, Albrecht, Haugeneder, Ernst, Irmscher, Mathias, Kaesmaier, Rainer, Kragler, Karl, Letzkus, Florian, Loeschner, Hans, Mathuni, Josef, Rangelow, Ivo W., Reuter, Carsten, Shi, F

Year:

1998

Language:

english

File:

PDF, 1.58 MB

english, 1998